2ee735d19b9c0e4a1593 · Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor

{
  "title_en": "Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor",
  "designation": "",
  "series": "",
  "status": "",
  "date": "1999-04-01",
  "date_original": "April 1, 1999",
  "url": "https://www.nist.gov/publications/ion-energy-distributions-and-sheath-voltages-radio-frequency-biased-inductively-coupled",
  "source": "NIST Publications",
  "display_en": "",
  "authors_en": "Mark A. Sobolewski , James K. Olthoff , Yicheng Wang",
  "abstract_excerpt_en": "",
  "id": "2ee735d19b9c0e4a1593",
  "sources": [
    "NIST Publications"
  ],
  "source_records": [
    {
      "title_en": "Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor",
      "designation": "",
      "series": "",
      "status": "",
      "date": "1999-04-01",
      "date_original": "April 1, 1999",
      "url": "https://www.nist.gov/publications/ion-energy-distributions-and-sheath-voltages-radio-frequency-biased-inductively-coupled",
      "source": "NIST Publications",
      "display_en": "",
      "authors_en": "Mark A. Sobolewski , James K. Olthoff , Yicheng Wang",
      "abstract_excerpt_en": ""
    }
  ],
  "translation_state": "none"
}