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3027f4fff980e24cf579 · Contrasting Conventional and Machine Learning Approaches to Optical Critical Dimension Measurements

Contrasting Conventional and Machine Learning Approaches to Optical Critical Dimension Measurements

Accurate, optics-based measurement of feature sizes at deep sub-wavelength dimensions has been conventionally challenged by improved manufacturing, including smaller linewidths, denser layouts, and greater materials complexity at near-atomic scales

Официальный источник · 2020-03-24

Полные импортированные сведения карточки
{
  "title_en": "Contrasting Conventional and Machine Learning Approaches to Optical Critical Dimension Measurements",
  "designation": "",
  "series": "",
  "status": "",
  "date": "2020-03-24",
  "date_original": "March 24, 2020",
  "url": "https://www.nist.gov/publications/contrasting-conventional-and-machine-learning-approaches-optical-critical-dimension",
  "source": "NIST Publications",
  "display_en": "",
  "authors_en": "Bryan M. Barnes , Mark Alexander Henn",
  "abstract_excerpt_en": "Accurate, optics-based measurement of feature sizes at deep sub-wavelength dimensions has been conventionally challenged by improved manufacturing, including smaller linewidths, denser layouts, and greater materials complexity at near-atomic scales",
  "id": "3027f4fff980e24cf579",
  "sources": [
    "NIST Publications"
  ],
  "source_records": [
    {
      "title_en": "Contrasting Conventional and Machine Learning Approaches to Optical Critical Dimension Measurements",
      "designation": "",
      "series": "",
      "status": "",
      "date": "2020-03-24",
      "date_original": "March 24, 2020",
      "url": "https://www.nist.gov/publications/contrasting-conventional-and-machine-learning-approaches-optical-critical-dimension",
      "source": "NIST Publications",
      "display_en": "",
      "authors_en": "Bryan M. Barnes , Mark Alexander Henn",
      "abstract_excerpt_en": "Accurate, optics-based measurement of feature sizes at deep sub-wavelength dimensions has been conventionally challenged by improved manufacturing, including smaller linewidths, denser layouts, and greater materials complexity at near-atomic scales"
    }
  ],
  "translation_state": "none"
}