435ad27f615bd053297d · Detection limits of AI-based SEM dimensional metrology
Detection limits of AI-based SEM dimensional metrology
The speed of in-line scanning electron microscope (SEM) measurements of linewidth, contact hole, and overlay is critically important for identifying the measurement area and generating indispensable process control information. Sample charging and damage
{
"title_en": "Detection limits of AI-based SEM dimensional metrology",
"designation": "",
"series": "",
"status": "",
"date": "2025-03-14",
"date_original": "March 14, 2025",
"url": "https://www.nist.gov/publications/detection-limits-ai-based-sem-dimensional-metrology",
"source": "NIST Publications",
"display_en": "",
"authors_en": "Peter Bajcsy , Brycie Wiseman , Michael Paul Majurski , Andras Vladar",
"abstract_excerpt_en": "The speed of in-line scanning electron microscope (SEM) measurements of linewidth, contact hole, and overlay is critically important for identifying the measurement area and generating indispensable process control information. Sample charging and damage",
"id": "435ad27f615bd053297d",
"sources": [
"NIST Publications"
],
"source_records": [
{
"title_en": "Detection limits of AI-based SEM dimensional metrology",
"designation": "",
"series": "",
"status": "",
"date": "2025-03-14",
"date_original": "March 14, 2025",
"url": "https://www.nist.gov/publications/detection-limits-ai-based-sem-dimensional-metrology",
"source": "NIST Publications",
"display_en": "",
"authors_en": "Peter Bajcsy , Brycie Wiseman , Michael Paul Majurski , Andras Vladar",
"abstract_excerpt_en": "The speed of in-line scanning electron microscope (SEM) measurements of linewidth, contact hole, and overlay is critically important for identifying the measurement area and generating indispensable process control information. Sample charging and damage"
}
],
"translation_state": "none"
}