NIST · ИТ · 4eea85485b2a0c14315c
Origin of Electrical Signals for Plasma Etching Endpoint Detection
Electrical signals are used for endpoint detection in plasma etching, but the origin of the electrical changes observed at endpoint is not known. They may be caused by changes in the gas-phase densities of etch products and reactants or by changes in
NIST · ИТОфициальный источник · 2011-11-18
{
"title_en": "Origin of Electrical Signals for Plasma Etching Endpoint Detection",
"designation": "",
"series": "",
"status": "",
"date": "2011-11-18",
"date_original": "November 18, 2011",
"url": "https://www.nist.gov/publications/origin-electrical-signals-plasma-etching-endpoint-detection",
"source": "NIST Publications",
"display_en": "",
"authors_en": "Mark A. Sobolewski",
"abstract_excerpt_en": "Electrical signals are used for endpoint detection in plasma etching, but the origin of the electrical changes observed at endpoint is not known. They may be caused by changes in the gas-phase densities of etch products and reactants or by changes in",
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{
"title_en": "Origin of Electrical Signals for Plasma Etching Endpoint Detection",
"designation": "",
"series": "",
"status": "",
"date": "2011-11-18",
"date_original": "November 18, 2011",
"url": "https://www.nist.gov/publications/origin-electrical-signals-plasma-etching-endpoint-detection",
"source": "NIST Publications",
"display_en": "",
"authors_en": "Mark A. Sobolewski",
"abstract_excerpt_en": "Electrical signals are used for endpoint detection in plasma etching, but the origin of the electrical changes observed at endpoint is not known. They may be caused by changes in the gas-phase densities of etch products and reactants or by changes in"
}
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