⌕ Поиск по атласу

NIST · ИТ · 773a3629fdcb8fb692a6

773a3629fdcb8fb692a6 · Electric Current Induced Thermomechanical Fatigue Testing of Interconnects

Electric Current Induced Thermomechanical Fatigue Testing of Interconnects

We demonstrate the use of electrical methods for evaluating the thermomechanical fatigue properties of patterned aluminum and copper interconnects on silicon-based substrates. Through a careful selection of alternating current frequency and current density

Официальный источник · 2005-03-01

Полные импортированные сведения карточки
{
  "title_en": "Electric Current Induced Thermomechanical Fatigue Testing of Interconnects",
  "designation": "",
  "series": "",
  "status": "",
  "date": "2005-03-01",
  "date_original": "March 1, 2005",
  "url": "https://www.nist.gov/publications/electric-current-induced-thermomechanical-fatigue-testing-interconnects",
  "source": "NIST Publications",
  "display_en": "",
  "authors_en": "Robert Keller , Roy H. Geiss , Yi-Wen Cheng , David T. Read",
  "abstract_excerpt_en": "We demonstrate the use of electrical methods for evaluating the thermomechanical fatigue properties of patterned aluminum and copper interconnects on silicon-based substrates. Through a careful selection of alternating current frequency and current density",
  "id": "773a3629fdcb8fb692a6",
  "sources": [
    "NIST Publications"
  ],
  "source_records": [
    {
      "title_en": "Electric Current Induced Thermomechanical Fatigue Testing of Interconnects",
      "designation": "",
      "series": "",
      "status": "",
      "date": "2005-03-01",
      "date_original": "March 1, 2005",
      "url": "https://www.nist.gov/publications/electric-current-induced-thermomechanical-fatigue-testing-interconnects",
      "source": "NIST Publications",
      "display_en": "",
      "authors_en": "Robert Keller , Roy H. Geiss , Yi-Wen Cheng , David T. Read",
      "abstract_excerpt_en": "We demonstrate the use of electrical methods for evaluating the thermomechanical fatigue properties of patterned aluminum and copper interconnects on silicon-based substrates. Through a careful selection of alternating current frequency and current density"
    }
  ],
  "translation_state": "none"
}