NIST · ИТ · 7b9735fce63ea583a68e
Electron Collision Data for Plasma-Processing Gases
Low-temperature plasma applications require detailed understanding of the physical and chemical processes occurring in the plasmas themselves. For instance, as the push for smaller feature sizes and higher quality devices in the semiconductor industry has
NIST · ИТОфициальный источник · 2000-10-01
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"title_en": "Electron Collision Data for Plasma-Processing Gases",
"designation": "",
"series": "",
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"date": "2000-10-01",
"date_original": "October 1, 2000",
"url": "https://www.nist.gov/publications/electron-collision-data-plasma-processing-gases",
"source": "NIST Publications",
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"authors_en": "Loucas G. Christophorou, James K. Olthoff",
"abstract_excerpt_en": "Low-temperature plasma applications require detailed understanding of the physical and chemical processes occurring in the plasmas themselves. For instance, as the push for smaller feature sizes and higher quality devices in the semiconductor industry has",
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"title_en": "Electron Collision Data for Plasma-Processing Gases",
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"authors_en": "Loucas G. Christophorou, James K. Olthoff",
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