NIST · ИТ · 95a19222acf4b032e944
Inductively Coupled Plasmas in Low Global Warming Potential Gases
Many high density discharges used in microelectronics fabrication use fluorocarbon gases with coincidentally high global-warming potentials (GWPs). We have determined the identities, fluxes, and energy distributions of ions produced in high density
NIST · ИТОфициальный источник · 2000-08-01
{
"title_en": "Inductively Coupled Plasmas in Low Global Warming Potential Gases",
"designation": "",
"series": "",
"status": "",
"date": "2000-08-01",
"date_original": "August 1, 2000",
"url": "https://www.nist.gov/publications/inductively-coupled-plasmas-low-global-warming-potential-gases",
"source": "NIST Publications",
"display_en": "",
"authors_en": "Amanda N. Goyettes, Yicheng Wang , James K. Olthoff",
"abstract_excerpt_en": "Many high density discharges used in microelectronics fabrication use fluorocarbon gases with coincidentally high global-warming potentials (GWPs). We have determined the identities, fluxes, and energy distributions of ions produced in high density",
"id": "95a19222acf4b032e944",
"sources": [
"NIST Publications"
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{
"title_en": "Inductively Coupled Plasmas in Low Global Warming Potential Gases",
"designation": "",
"series": "",
"status": "",
"date": "2000-08-01",
"date_original": "August 1, 2000",
"url": "https://www.nist.gov/publications/inductively-coupled-plasmas-low-global-warming-potential-gases",
"source": "NIST Publications",
"display_en": "",
"authors_en": "Amanda N. Goyettes, Yicheng Wang , James K. Olthoff",
"abstract_excerpt_en": "Many high density discharges used in microelectronics fabrication use fluorocarbon gases with coincidentally high global-warming potentials (GWPs). We have determined the identities, fluxes, and energy distributions of ions produced in high density"
}
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}