b340431d477e7fbd2bd3 · Diagnostic Measurements in RF Plasmas for Materials Processing

{
  "title_en": "Diagnostic Measurements in RF Plasmas for Materials Processing",
  "designation": "",
  "series": "",
  "status": "",
  "date": "1992-07-01",
  "date_original": "July 1, 1992",
  "url": "https://www.nist.gov/publications/diagnostic-measurements-rf-plasmas-materials-processing",
  "source": "NIST Publications",
  "display_en": "",
  "authors_en": "J R. Roberts , James K. Olthoff , Mark A. Sobolewski , Richard J. Van Brunt , James Whetstone , S. Djurovic",
  "abstract_excerpt_en": "",
  "id": "b340431d477e7fbd2bd3",
  "sources": [
    "NIST Publications"
  ],
  "source_records": [
    {
      "title_en": "Diagnostic Measurements in RF Plasmas for Materials Processing",
      "designation": "",
      "series": "",
      "status": "",
      "date": "1992-07-01",
      "date_original": "July 1, 1992",
      "url": "https://www.nist.gov/publications/diagnostic-measurements-rf-plasmas-materials-processing",
      "source": "NIST Publications",
      "display_en": "",
      "authors_en": "J R. Roberts , James K. Olthoff , Mark A. Sobolewski , Richard J. Van Brunt , James Whetstone , S. Djurovic",
      "abstract_excerpt_en": ""
    }
  ],
  "translation_state": "none"
}