NIST · ИТ · b975a7366dd61823805e
Relating Human and AI-based Detection Limits in SEM Dimensional Metrology
Background: The nanoscale measurements of critical dimensions in semiconductor manufacturing rely on scanning electron microscopy (SEM) and SEM image analyses. The acquisition of SEM images requires a low primary electron beam current and a low dose of the
NIST · ИТОфициальный источник · 2025-10-25
{
"title_en": "Relating Human and AI-based Detection Limits in SEM Dimensional Metrology",
"designation": "",
"series": "",
"status": "",
"date": "2025-10-25",
"date_original": "October 25, 2025",
"url": "https://www.nist.gov/publications/relating-human-and-ai-based-detection-limits-sem-dimensional-metrology",
"source": "NIST Publications",
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"authors_en": "Peter Bajcsy , Pushkar Sathe , Andras Vladar",
"abstract_excerpt_en": "Background: The nanoscale measurements of critical dimensions in semiconductor manufacturing rely on scanning electron microscopy (SEM) and SEM image analyses. The acquisition of SEM images requires a low primary electron beam current and a low dose of the",
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{
"title_en": "Relating Human and AI-based Detection Limits in SEM Dimensional Metrology",
"designation": "",
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"date": "2025-10-25",
"date_original": "October 25, 2025",
"url": "https://www.nist.gov/publications/relating-human-and-ai-based-detection-limits-sem-dimensional-metrology",
"source": "NIST Publications",
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"authors_en": "Peter Bajcsy , Pushkar Sathe , Andras Vladar",
"abstract_excerpt_en": "Background: The nanoscale measurements of critical dimensions in semiconductor manufacturing rely on scanning electron microscopy (SEM) and SEM image analyses. The acquisition of SEM images requires a low primary electron beam current and a low dose of the"
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