bb5e21060edda60ea8a5 · On-Wafer Measurements of Noise Temperature
On-Wafer Measurements of Noise Temperature
The NIST Noise Project has developed the theoretical formalism and experimental methods for performing accurate noise-temperature measurements on wafer. This report summarizes the theoretical formulation and describes the design, methods, and results of
{
"title_en": "On-Wafer Measurements of Noise Temperature",
"designation": "",
"series": "",
"status": "",
"date": "1999-12-01",
"date_original": "December 1, 1999",
"url": "https://www.nist.gov/publications/wafer-measurements-noise-temperature",
"source": "NIST Publications",
"display_en": "",
"authors_en": "James P. Randa , Robert L. Billinger",
"abstract_excerpt_en": "The NIST Noise Project has developed the theoretical formalism and experimental methods for performing accurate noise-temperature measurements on wafer. This report summarizes the theoretical formulation and describes the design, methods, and results of",
"id": "bb5e21060edda60ea8a5",
"sources": [
"NIST Publications"
],
"source_records": [
{
"title_en": "On-Wafer Measurements of Noise Temperature",
"designation": "",
"series": "",
"status": "",
"date": "1999-12-01",
"date_original": "December 1, 1999",
"url": "https://www.nist.gov/publications/wafer-measurements-noise-temperature",
"source": "NIST Publications",
"display_en": "",
"authors_en": "James P. Randa , Robert L. Billinger",
"abstract_excerpt_en": "The NIST Noise Project has developed the theoretical formalism and experimental methods for performing accurate noise-temperature measurements on wafer. This report summarizes the theoretical formulation and describes the design, methods, and results of"
}
],
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}