e2512853e05dac0923cd · Origin of Electrical Signals for Plasma Etching Endpoint Detection: Comparison of Endpoint Signals and Electron Density
Origin of Electrical Signals for Plasma Etching Endpoint Detection: Comparison of Endpoint Signals and Electron Density
Electrical signals are used for endpoint detection in plasma etching, but the origin of the electrical changes observed at endpoint is not well understood. As an etch breaks through one layer and exposes an underlayer, the fluxes and densities of etch
{
"title_en": "Origin of Electrical Signals for Plasma Etching Endpoint Detection: Comparison of Endpoint Signals and Electron Density",
"designation": "",
"series": "",
"status": "",
"date": "2012-07-23",
"date_original": "July 23, 2012",
"url": "https://www.nist.gov/publications/origin-electrical-signals-plasma-etching-endpoint-detection-comparison-endpoint-signals",
"source": "NIST Publications",
"display_en": "",
"authors_en": "Mark A. Sobolewski , David L. Lahr",
"abstract_excerpt_en": "Electrical signals are used for endpoint detection in plasma etching, but the origin of the electrical changes observed at endpoint is not well understood. As an etch breaks through one layer and exposes an underlayer, the fluxes and densities of etch",
"id": "e2512853e05dac0923cd",
"sources": [
"NIST Publications"
],
"source_records": [
{
"title_en": "Origin of Electrical Signals for Plasma Etching Endpoint Detection: Comparison of Endpoint Signals and Electron Density",
"designation": "",
"series": "",
"status": "",
"date": "2012-07-23",
"date_original": "July 23, 2012",
"url": "https://www.nist.gov/publications/origin-electrical-signals-plasma-etching-endpoint-detection-comparison-endpoint-signals",
"source": "NIST Publications",
"display_en": "",
"authors_en": "Mark A. Sobolewski , David L. Lahr",
"abstract_excerpt_en": "Electrical signals are used for endpoint detection in plasma etching, but the origin of the electrical changes observed at endpoint is not well understood. As an etch breaks through one layer and exposes an underlayer, the fluxes and densities of etch"
}
],
"translation_state": "none"
}